发明申请
- 专利标题: PROBE POLISHING METHOD, PROGRAM THEREFOR, AND PROBE APPARATUS
- 专利标题(中): 探针抛光方法,程序和探针装置
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申请号: US12545184申请日: 2009-08-21
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公开(公告)号: US20100048099A1公开(公告)日: 2010-02-25
- 发明人: Hideaki TANAKA , Satoshi Sano
- 申请人: Hideaki TANAKA , Satoshi Sano
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-216012 20080825
- 主分类号: B24B51/00
- IPC分类号: B24B51/00 ; B24B49/12 ; B24B1/00
摘要:
A probe polishing method is provided for polishing probes by brining a polishing member into slide-contact with probes through a mounting table having thereon the polishing member transferred from a first receiving part. The probe polishing method includes transferring the polishing member from the first receiving part to the mounting table; detecting a presence of foreign materials on a top surface of the polishing member mounted on the mounting table; transferring the polishing member from the mounting table to a second receiving part when the foreign materials are detected on the top surface of the polishing member; removing the foreign materials from the polishing member in the second receiving part; and transferring the polishing member from which the foreign materials are removed from the second receiving part to the first receiving part.
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