发明申请
- 专利标题: SEMICONDUCTOR LASER DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 半导体激光器件及其制造方法
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申请号: US12274101申请日: 2008-11-19
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公开(公告)号: US20090129418A1公开(公告)日: 2009-05-21
- 发明人: Hiroaki MATSUMURA
- 申请人: Hiroaki MATSUMURA
- 申请人地址: JP Anan-shi
- 专利权人: Nichia Corporation
- 当前专利权人: Nichia Corporation
- 当前专利权人地址: JP Anan-shi
- 优先权: JPP2000-172797 20000608; JPP2001-116197 20010413
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01L21/00
摘要:
A method for manufacturing a semiconductor laser device includes forming a laminate having a semiconductor layer of a first conductivity type, an active layer and a semiconductor layer of a second conductivity type. The waveguide region is formed to guide light perpendicular to the direction of width by restricting the light from spreading in the direction of width in the active layer, such that the semiconductor laser device has a first waveguide region and a second waveguide region. The first waveguide region is formed to confine light within the limited active layer by means of a difference in the refractive index between the active layer and the regions on both sides of the active layer by limiting the width of the active layer. In forming the second waveguide region, light is confined therein by providing effective difference in refractive index in the active layer.
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