发明申请
- 专利标题： AGITATION OF ELECTROLYTIC SOLUTION IN ELECTRODEPOSITION
- 专利标题（中）： 电解溶液在电沉积中的研究
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申请号： US11744046申请日： 2007-05-03
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公开(公告)号： US20080271995A1公开(公告)日： 2008-11-06
- 发明人: Sergey Savastiouk , Valentin Kosenko , Alexander J. Berger
- 申请人： Sergey Savastiouk , Valentin Kosenko , Alexander J. Berger
- 主分类号： C25D21/10
- IPC分类号： C25D21/10 ; C25D17/00 ; C25D21/12
摘要：
In a reverse pulse plating of a substrate (110), the electrolytic solution is agitated with a greater power on forward pulses (210) than on reverse pulses (220). An ultrasound agitation source (170) can be positioned at the bottom of the substrate (110) if the anode (134) is at the top. The ultrasound source may contact the substrate's bottom. Other features are also provided.
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