发明申请
- 专利标题： Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor
- 专利标题（中）： 用于半导体的冷凝型含聚合物的防反射涂层
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申请号： US11547001申请日： 2005-04-06
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公开(公告)号： US20080038678A1公开(公告)日： 2008-02-14
- 发明人: Takahiro Kishioka , Rikimaru Sakamoto , Yoshiomi Hiroi , Daisuke Maruyama
- 申请人： Takahiro Kishioka , Rikimaru Sakamoto , Yoshiomi Hiroi , Daisuke Maruyama
- 申请人地址： JP TOKYO
- 专利权人： NISSAN CHEMICAL INDUSTRIES LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES LTD.
- 当前专利权人地址： JP TOKYO
- 优先权： JP2004-115385 20040406
- 国际申请： PCT/JP05/06785 WO 20050406
- 主分类号： C08G73/20
- IPC分类号： C08G73/20 ; B05D3/02 ; G03C5/00
摘要：
There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.
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