Invention Application
- Patent Title: EEPROM DEVICE AND METHOD OF FABRICATING THE SAME
- Patent Title (中): EEPROM装置及其制造方法
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Application No.: US11775871Application Date: 2007-07-11
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Publication No.: US20080012062A1Publication Date: 2008-01-17
- Inventor: Hyun-Khe YOO , Jeong-Uk HAN , Hee-Seog JEON , Sung-Gon CHOI , Bo-young SEO , Chang-Min JEON , Ji-Do RYU
- Applicant: Hyun-Khe YOO , Jeong-Uk HAN , Hee-Seog JEON , Sung-Gon CHOI , Bo-young SEO , Chang-Min JEON , Ji-Do RYU
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR2006-66526 20060714
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L21/336

Abstract:
An electrically erasable programmable read-only memory (EEPROM) device includes an EEPROM cell located on a semiconductor substrate, the EEPROM cell including a memory transistor and a selection transistor. A source region and a drain region are located on the semiconductor substrate adjacent to opposite sides of the EEPROM cell, respectively, and a floating region is positioned between the memory transistor and the selection transistor. The source region includes a first doped region, a second doped region and a third doped region, where the first doped region surrounds a bottom surface and sidewalls of the second doped region, and the second doped surrounds a bottom surface and sidewalls of the third doped region. Also, a second impurity concentration of the second doped region is higher than that of the first doped region and lower than that of the third doped region.
Information query
IPC分类: