发明申请
- 专利标题: Method of manufacturing capacitor-embedded low temperature co-fired ceramic substrate
- 专利标题(中): 制造电容器嵌入式低温共烧陶瓷基板的方法
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申请号: US11819897申请日: 2007-06-29
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公开(公告)号: US20080000061A1公开(公告)日: 2008-01-03
- 发明人: Seung Gyo Jeong , Yong Seok Choi , Ki Pyo Hong
- 申请人: Seung Gyo Jeong , Yong Seok Choi , Ki Pyo Hong
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 优先权: KR10-2006-60706 20060630
- 主分类号: H01G9/00
- IPC分类号: H01G9/00
摘要:
A method of manufacturing a capacitor-embedded low temperature co-fired ceramic substrate, the method including: manufacturing a capacitor part by firing a deposition including at least one high dielectric ceramic sheet to form a capacitor part; providing a plurality of low temperature co-fired green sheets each having at least one of a conductive pattern and a conductive via hole thereon; forming a low temperature co-fired ceramic deposition by depositing the low temperature co-fired green sheets to embed the capacitor part in the low temperature co-fired ceramic deposition, the embedded capacitor part connected to the one of conductive pattern and conductive via hole of an adjacent one of the green sheets; and firing the low temperature co-fired ceramic deposition having the capacitor part embedded therein. The capacitor-embedded low temperature co-fired ceramic substrate may be beneficially employed in various types of capacitor part such as a deposited chip capacitor and a capacitor layer structure.
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