发明申请
US20070267040A1 Substrate cleaning method, substrate cleaning system and program storage medium
有权
基板清洗方法，基板清洗系统和程序存储介质
- 专利标题： Substrate cleaning method, substrate cleaning system and program storage medium
- 专利标题（中）： 基板清洗方法，基板清洗系统和程序存储介质
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申请号： US11798599申请日： 2007-05-15
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公开(公告)号： US20070267040A1公开(公告)日： 2007-11-22
- 发明人: Tsukasa Watanabe , Naoki Shindo , Koukichi Hiroshiro , Yuji Kamikawa
- 申请人： Tsukasa Watanabe , Naoki Shindo , Koukichi Hiroshiro , Yuji Kamikawa
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 优先权： JP2006-140377 20060519
- 主分类号： B08B3/12
- IPC分类号： B08B3/12
摘要：
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.
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