Invention Application
- Patent Title: NOR Flash Memory and Fabrication Process
- Patent Title (中): NOR闪存和制造工艺
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Application No.: US11381948Application Date: 2006-05-05
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Publication No.: US20070257299A1Publication Date: 2007-11-08
- Inventor: Bomy Chen , Prateep Tuntasood , Der-Tsyr Fan
- Applicant: Bomy Chen , Prateep Tuntasood , Der-Tsyr Fan
- Applicant Address: US CA Sunnyvale
- Assignee: Silicon Storage Technology, Inc.
- Current Assignee: Silicon Storage Technology, Inc.
- Current Assignee Address: US CA Sunnyvale
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
Semiconductor memory array and process of fabrication in which a plurality of bit line diffusions are formed in a substrate, and memory cells formed in pairs between the bit line diffusions, with each of the pairs of cells having first and second conductors adjacent to the bit line diffusions, floating gates beside the first and second conductors, an erase gate between the floating gates, and a source line diffusion in the substrate beneath the erase gate, and at least one additional conductor capacitively coupled to the floating gates. In some disclosed embodiments, the conductors adjacent to the bit line diffusions are word lines, and the additional conductors consist of either a pair of coupling gates which are coupled to respective ones of the floating gates or a single coupling gate which is coupled to both of the floating gates. In another embodiment, the conductors adjacent to the bit line diffusions are program lines, and the third conductors are word lines which extend in a direction perpendicular to the program lines and the diffusions.
Public/Granted literature
- US07598561B2 NOR flash memory Public/Granted day:2009-10-06
Information query
IPC分类: