Invention Application
- Patent Title: Fabrication of metallic microstructures via exposure of photosensitive composition
- Patent Title (中): 通过感光组合物的曝光制造金属微结构
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Application No.: US11789622Application Date: 2007-04-25
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Publication No.: US20070254110A1Publication Date: 2007-11-01
- Inventor: Tao Deng , Francisco Arias , Rustem Ismagilov , Paul Kenis , George Whitesides
- Applicant: Tao Deng , Francisco Arias , Rustem Ismagilov , Paul Kenis , George Whitesides
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Main IPC: B05D3/00
- IPC: B05D3/00
Abstract:
A method of forming microstructures. An article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental metal. Additional conductive material may then be deposited onto the elemental metal to produce a microstructure.
Public/Granted literature
- US07774920B2 Fabrication of metallic microstructures via exposure of photosensitive compostion Public/Granted day:2010-08-17
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