Invention Application
- Patent Title: Method For Production Of Micro-Optics Structures
- Patent Title (中): 微光学结构的生产方法
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Application No.: US10565623Application Date: 2004-07-25
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Publication No.: US20070218372A1Publication Date: 2007-09-20
- Inventor: Zeev Zalevsky , Vardit Eckhouse , Izhar Eyal , Arkady Rudnitsky , Nadav Cohen , Yuval Kapplener
- Applicant: Zeev Zalevsky , Vardit Eckhouse , Izhar Eyal , Arkady Rudnitsky , Nadav Cohen , Yuval Kapplener
- Applicant Address: IL Hertzliya 46733
- Assignee: EXPLAY LTD.
- Current Assignee: EXPLAY LTD.
- Current Assignee Address: IL Hertzliya 46733
- Priority: US60490655 20030724
- International Application: PCT/IL04/00678 WO 20040725
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G02B26/00

Abstract:
A novel method for fabricating a micro-optics structure, having at least one lenslet array, is presented. A writing mask is provided being configured in accordance with an arrangement of the lenslet array to be manufactured. The writing mask is applied to a structure formed by a photosensitive layer of a predetermined thickness carried by a substrate, and the photosensitive layer is exposed through the writing mask using a predetermined spectral range of the exposure and a predetermined distance between the mask and said photosensitive layer, to thereby pattern the photosensitive layer through a diffractive optical element of said mask. The so-obtained pattern is in the form of optical nonhomogeneities in the photosensitive layer material, defining the lenslet array within the photosensitive layer.
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