Invention Application
US20070112183A1 Chitin oligomer composition and/or chitosan oligomer composition and processes for preparation thereof
审中-公开
壳多糖低聚物组合物和/或壳聚糖低聚物组合物及其制备方法
- Patent Title: Chitin oligomer composition and/or chitosan oligomer composition and processes for preparation thereof
- Patent Title (中): 壳多糖低聚物组合物和/或壳聚糖低聚物组合物及其制备方法
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Application No.: US10555384Application Date: 2004-05-06
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Publication No.: US20070112183A1Publication Date: 2007-05-17
- Inventor: Hisao Kitano , Hiroshi Shimizu , Masakatsu Nozaki , Fumio Tanimoto , Hirohisa Kikuyama , Masahide Waki , Kanenori Ito , Shinji Hashiguchi
- Applicant: Hisao Kitano , Hiroshi Shimizu , Masakatsu Nozaki , Fumio Tanimoto , Hirohisa Kikuyama , Masahide Waki , Kanenori Ito , Shinji Hashiguchi
- Applicant Address: JP KYOTO 606-0805 JP OSAKA 541-0047
- Assignee: RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT,STELLA CHEMIFA CORPORATION
- Current Assignee: RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT,STELLA CHEMIFA CORPORATION
- Current Assignee Address: JP KYOTO 606-0805 JP OSAKA 541-0047
- Priority: JP2003-128660 20030507; JP2003-128644 20030507; JP2003-128646 20030507; JP2003-168693 20030613
- International Application: PCT/JP04/06429 WO 20040506
- Main IPC: C08B37/08
- IPC: C08B37/08
Abstract:
This invention aims to develop a chitin oligomer composition and/or a chitosan oligomer composition wherein the content of an oligomer from a trimer to a decamer is 60% or more, and to develop a process for preparing the above-mentioned oligomer composition. The object of the invention can be achieved by mixing hydrofluoric acid or hydrohalogenated acid other than hydrofluoric acid and hydrofluoric acid with a chitin-based material and/or a chitosan-based material.
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