Provided is a method of forming micro-patterns using a multi-photolithography process, including: providing an etch target layer where micro-patterns are to be formed; forming a mask layer on the etch target layer; forming a first mask pattern including engraved portions and embossed portions by etching a predetermined region of the mask layer; forming a final mask pattern in the first mask pattern by etching a predetermined region of the residual embossed portions of the mask layer; and forming micro-patterns by etching the etch target layer using the final mask pattern as an etch mask.