发明申请
- 专利标题: Trench-gate field effect transistors and methods of forming the same
- 专利标题(中): 沟槽栅场效应晶体管及其形成方法
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申请号: US11441386申请日: 2006-05-24
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公开(公告)号: US20060273386A1公开(公告)日: 2006-12-07
- 发明人: Hamza Yilmaz , Daniel Calafut , Christopher Kocon , Steven Sapp , Dean Probst , Nathan Kraft , Thomas Grebs , Rodney Ridley , Gary Dolny , Bruce Marchant , Joseph Yedinak
- 申请人: Hamza Yilmaz , Daniel Calafut , Christopher Kocon , Steven Sapp , Dean Probst , Nathan Kraft , Thomas Grebs , Rodney Ridley , Gary Dolny , Bruce Marchant , Joseph Yedinak
- 主分类号: H01L29/94
- IPC分类号: H01L29/94
摘要:
A field effect transistor includes a body region of a first conductivity type over a semiconductor region of a second conductivity type. A gate trench extends through the body region and terminates within the semiconductor region. At least one conductive shield electrode is disposed in the gate trench. A gate electrode is disposed in the gate trench over but insulated from the at least one conductive shield electrode. A shield dielectric layer insulates the at lease one conductive shield electrode from the semiconductor region. A gate dielectric layer insulates the gate electrode from the body region. The shield dielectric layer is formed such that it flares out and extends directly under the body region.
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