Invention Application
- Patent Title: Method for manufacturing electron emission element, electron source, and image forming apparatus
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Application No.: US11234277Application Date: 2005-09-26
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Publication No.: US20060252335A1Publication Date: 2006-11-09
- Inventor: Toshikazu Onishi , Yoshikazu Banno , Michiyo Nishimura , Toshihiko Takeda , Keisuke Yamamoto , Tomoko Maruyama
- Applicant: Toshikazu Onishi , Yoshikazu Banno , Michiyo Nishimura , Toshihiko Takeda , Keisuke Yamamoto , Tomoko Maruyama
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Priority: JP10-029538 19980212
- Main IPC: H01J9/44
- IPC: H01J9/44 ; H01J9/00

Abstract:
A method for manufacturing an electron emission element comprising, between its electrodes, a conductive film having an electron emission section. The method comprising the steps of forming a gap in the conductive film located between the electrodes, and applying a voltage between the electrodes in an atmosphere that has an aromatic compound with a polarity or a polar group and in which the partial pressure ratio of water to the aromatic compound is 100 or less.
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