Invention Application
- Patent Title: Integration type semiconductor device and method for manufacturing the same
- Patent Title (中): 集成型半导体器件及其制造方法
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Application No.: US11270458Application Date: 2005-11-10
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Publication No.: US20060097407A1Publication Date: 2006-05-11
- Inventor: Hiroyasu Ito
- Applicant: Hiroyasu Ito
- Applicant Address: JP Kariya-city
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya-city
- Priority: JP2004-328124 20041111; JP2005-298076 20051012
- Main IPC: H01L23/52
- IPC: H01L23/52

Abstract:
A semiconductor device includes: a plurality of power MOS cells on a semiconductor substrate; a plurality of lead wires connecting to a source and a drain of each power MOS cell through a contact hole; a plurality of collecting electrodes connecting in parallel with the lead wires through a via hole; an interlayer protection film on the collecting electrode; a thick film electrode connecting to the collecting electrode through the opening; and a terminal protection film having an opening for bonding connection. The openings are formed in the interlayer protection film such that a portion between the openings becomes a beam shape
Public/Granted literature
- US07420283B2 Integration type semiconductor device and method for manufacturing the same Public/Granted day:2008-09-02
Information query
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