Invention Application
US20060097407A1 Integration type semiconductor device and method for manufacturing the same 有权
集成型半导体器件及其制造方法

  • Patent Title: Integration type semiconductor device and method for manufacturing the same
  • Patent Title (中): 集成型半导体器件及其制造方法
  • Application No.: US11270458
    Application Date: 2005-11-10
  • Publication No.: US20060097407A1
    Publication Date: 2006-05-11
  • Inventor: Hiroyasu Ito
  • Applicant: Hiroyasu Ito
  • Applicant Address: JP Kariya-city
  • Assignee: DENSO CORPORATION
  • Current Assignee: DENSO CORPORATION
  • Current Assignee Address: JP Kariya-city
  • Priority: JP2004-328124 20041111; JP2005-298076 20051012
  • Main IPC: H01L23/52
  • IPC: H01L23/52
Integration type semiconductor device and method for manufacturing the same
Abstract:
A semiconductor device includes: a plurality of power MOS cells on a semiconductor substrate; a plurality of lead wires connecting to a source and a drain of each power MOS cell through a contact hole; a plurality of collecting electrodes connecting in parallel with the lead wires through a via hole; an interlayer protection film on the collecting electrode; a thick film electrode connecting to the collecting electrode through the opening; and a terminal protection film having an opening for bonding connection. The openings are formed in the interlayer protection film such that a portion between the openings becomes a beam shape
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