- 专利标题: Circuit structure and fabrication method thereof
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申请号: US17096968申请日: 2020-11-13
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公开(公告)号: US12133337B2公开(公告)日: 2024-10-29
- 发明人: Yi Hung Lin , Li-Wei Sung
- 申请人: Innolux Corporation
- 申请人地址: TW Miao-Li County
- 专利权人: Innolux Corporation
- 当前专利权人: Innolux Corporation
- 当前专利权人地址: TW Miaoli County
- 代理机构: JCIPRNET
- 优先权: CN 2010578387.4 2020.06.23
- 主分类号: H05K1/02
- IPC分类号: H05K1/02 ; H05K1/11 ; H05K1/18 ; H05K3/00 ; H05K3/34
摘要:
A circuit structure and a fabrication method thereof are provided. The fabrication method of the circuit structure includes the following steps: providing a substrate; fabricating a test circuit component on the substrate; fabricating a solder pad on the test circuit component; fabricating an insulating layer; and fabricating a conductive pad on the insulating layer. A second surface of the insulating layer covers the test circuit component and the solder pad. The conductive pad is coupled to the solder pad. Through the fabrication method of the circuit structure provided by the disclosure, circuit quality of the circuit structure may be monitored, and that reliability of the circuit structure provided by the disclosure is improved.
公开/授权文献
- US20210400819A1 CIRCUIT STRUCTURE AND FABRICATION METHOD THEREOF 公开/授权日:2021-12-23
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