Invention Grant
- Patent Title: High density two-tier MRAM structure
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Application No.: US17513273Application Date: 2021-10-28
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Publication No.: US11937435B2Publication Date: 2024-03-19
- Inventor: Ashim Dutta , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Gavin Giraud
- Main IPC: H10B61/00
- IPC: H10B61/00 ; H10N50/01 ; H10N50/80 ; H10N50/85

Abstract:
Embodiments disclosed herein include a semiconductor structure. The semiconductor structure may include a semiconductor structure. The semiconductor structure may include an embedded magnetic random access memory (MRAM) array electrically connected between a bottom metal level and a top metal level. The MRAM array may include a first tier with first MRAM cells and first vias above the first MRAM cells, and a second tier with second MRAM cells and second vias below the second MRAM cells.
Public/Granted literature
- US20230133023A1 HIGH DENSITY TWO-TIER MRAM STRUCTURE Public/Granted day:2023-05-04
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