- 专利标题： Fluid processing systems including a plurality of material tanks, at least one mixing tank, at least one holding tank, and recirculation loops
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申请号： US16213160申请日： 2018-12-07
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公开(公告)号： US11925912B2公开(公告)日： 2024-03-12
- 发明人: Shih-Pin Chou , Wen-Hung Chang , Deepak Mahulikar , Tamas Varga , Abhudaya Mishra
- 申请人： Fujifilm Electronic Materials U.S.A., Inc.
- 申请人地址： US RI N. Kingstown
- 专利权人： Fujifilm Electronic Materials U.S.A., Inc.
- 当前专利权人： Fujifilm Electronic Materials U.S.A., Inc.
- 当前专利权人地址： US RI N. Kingstown
- 代理机构： Fish & Richardson P.C.
- 主分类号： B01F33/84
- IPC分类号： B01F33/84 ; B01F23/40 ; B01F23/45 ; B01F23/50 ; B01F23/53 ; B01F23/80 ; B01F25/50 ; B01F27/191 ; B01F35/21 ; B01F35/22 ; B01F35/71 ; B01F101/27 ; B24B57/00 ; B24B57/02 ; C09G1/02
摘要：
The disclosure features a system that includes a plurality of material tanks, each of which includes at least one material for forming a chemical composition and includes a first recirculation loop; at least one mixing tank in which the materials from the material tanks are mixed to form a chemical composition, the mixing tank including a second recirculation loop; and at least one holding tank configured to continuously receive the chemical composition from the mixing tank, the holding tank including a third recirculation loop. The system may further include a plurality of fluid flow controller units and be configured to form material and chemical composition flows in an in-process steady state.
公开/授权文献
- US20190105620A1 ADVANCED FLUID PROCESSING METHODS AND SYSTEMS 公开/授权日：2019-04-11
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