- 专利标题: Lateral bipolar junction transistors with a back-gate
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申请号: US17692517申请日: 2022-03-11
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公开(公告)号: US11923417B2公开(公告)日: 2024-03-05
- 发明人: Hong Yu , Shesh Mani Pandey
- 申请人: GlobalFoundries U.S. Inc.
- 申请人地址: US NY Malta
- 专利权人: GlobalFoundries U.S. Inc.
- 当前专利权人: GlobalFoundries U.S. Inc.
- 当前专利权人地址: US NY Malta
- 代理机构: Thompson Hine LLP
- 代理商 Francois Pagette
- 主分类号: H01L29/10
- IPC分类号: H01L29/10 ; H01L21/8222 ; H01L27/082 ; H01L29/66 ; H01L29/735 ; H01L29/737
摘要:
Structures for a bipolar junction transistor and methods of forming a structure for a bipolar junction transistor. The structure includes a substrate having a well, a first terminal including a first raised semiconductor layer, a second terminal including a second raised semiconductor layer, and a base layer positioned in a lateral direction between the first raised semiconductor layer of the first terminal and the second raised semiconductor layer of the second terminal. The base layer has an overlapping arrangement with the well. The structure further includes a dielectric layer positioned in a vertical direction between the first terminal and the substrate, the second terminal and the substrate, and the base layer and the substrate.
公开/授权文献
- US20230112235A1 LATERAL BIPOLAR JUNCTION TRANSISTORS WITH A BACK-GATE 公开/授权日:2023-04-13
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