发明授权
- 专利标题: Washing methods for ethylene-acrylic acid copolymer manufacturing process using solvent
-
申请号: US17484015申请日: 2021-09-24
-
公开(公告)号: US11905346B2公开(公告)日: 2024-02-20
- 发明人: Byoung Kyu Kwak , Sun Joo Kim , Hong Chan Kim , Kyung Jin Ma , Doh Yeon Park , Jae Eun Lee , Ho Seong Lee , Juan Carlos Estevez Videira , Manuel David Recasens Alvaro , In Su Lee , Wan Ju Jeong
- 申请人: SK Innovation Co., Ltd. , SK Geo Centric Co., Ltd.
- 申请人地址: KR Seoul
- 专利权人: SK Innovation Co., Ltd.,SK Geo Centric Co., Ltd.
- 当前专利权人: SK Innovation Co., Ltd.,SK Geo Centric Co., Ltd.
- 当前专利权人地址: KR Seoul; KR Seoul
- 代理机构: The Webb Law Firm
- 优先权: KR 20200124337 2020.09.25
- 主分类号: C08F2/01
- IPC分类号: C08F2/01 ; C08F2/06 ; C08F6/00 ; C08F6/10 ; C08F210/02 ; C08F220/04 ; B01J8/00 ; B01J19/00 ; B01J19/06 ; B01J19/24 ; B01J8/22 ; B01J20/30 ; C08F220/08 ; C08F6/06
摘要:
The present invention relates to a method for producing an ethylene-based copolymer, and more particularly, to a method for producing an ethylene-based copolymer capable of increasing process efficiency by preventing plugging and corrosion of a facility. The method for producing an ethylene-based copolymer includes a producing mode and a washing mode of which one is selectively performed. The producing mode includes: a) hyper-compressing primary compressed ethylene, and a mixture including a carboxylic acid-containing comonomer and a polar solvent to produce a compressed material; b) reacting the compressed material to produce a reaction product including an ethylene-based copolymer; and c) separating and recovering unreacted residues from the reaction product and introducing the unreacted residues into the mixture of step a). The washing mode includes: re-supplying the compressed material produced in step a) to step a) as a mixture, without performing step b).
公开/授权文献
信息查询