- 专利标题: Ion generation device, discharge substrate, and electronic device
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申请号: US17296113申请日: 2019-11-20
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公开(公告)号: US11881685B2公开(公告)日: 2024-01-23
- 发明人: Nobuyuki Ohe , Tetsuya Ezaki , Satoshi Okano
- 申请人: SHARP KABUSHIKI KAISHA
- 申请人地址: JP Sakai
- 专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人地址: JP Sakai
- 代理机构: ScienBiziP, P.C.
- 优先权: JP 18221708 2018.11.27
- 国际申请: PCT/JP2019/045386 2019.11.20
- 国际公布: WO2020/110851A 2020.06.04
- 进入国家日期: 2021-05-21
- 主分类号: H01T23/00
- IPC分类号: H01T23/00 ; B03C3/41 ; H01L21/84
摘要:
An ion generation device includes a discharge electrode substrate, an induction electrode substrate, and an insulating resin. The discharge electrode substrate on which a discharge electrode is mounted and a first electrode connected to the discharge electrode is formed. The induction electrode substrate on which an induction electrode configured to generate a discharge between the induction electrode and the discharge electrode and a second electrode connected to the induction electrode are formed. The insulating resin is filled at least between the discharge electrode and the induction electrode. The insulating resin provides insulation between the discharge electrode and the induction electrode. The first electrode and the second electrode are disposed and face each other at least partially. The first electrode, the second electrode, and the insulating resin interposed between the first electrode and the second electrode form a capacitor.
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