- 专利标题: Field effect transistor having field plate
-
申请号: US16671438申请日: 2019-11-01
-
公开(公告)号: US11862691B2公开(公告)日: 2024-01-02
- 发明人: Michael S. Davis , Eduardo M. Chumbes , Brian T. Appleton, Jr.
- 申请人: Raytheon Company
- 申请人地址: US MA Waltham
- 专利权人: Raytheon Company
- 当前专利权人: Raytheon Company
- 当前专利权人地址: US MA Waltham
- 代理机构: DALY, CROWLEY, MOFFORD & DURKEE, LLP
- 主分类号: H01L29/40
- IPC分类号: H01L29/40
摘要:
A field effect transistor having a field plate structure for shaping an electric field in a region between the gate and the drain, such field plate structure having: a dielectric layer disposed on gate and on the surface of the semiconductor in the region between gate and the drain; and electric charge disposed in portions of the dielectric layer, a portion of such charge being disposed in the dielectric layer over an upper surface of the gate and another portion of the change extending from the upper surface of the gate into the region between gate and the drain; and wherein the electric charge solely produces the electric field.
公开/授权文献
- US20210134965A1 FIELD EFFECT TRANSISTOR HAVING FIELD PLATE 公开/授权日:2021-05-06
信息查询
IPC分类: