- 专利标题: Device, apparatus, and method for semiconductor transfer
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申请号: US17369360申请日: 2021-07-07
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公开(公告)号: US11862502B2公开(公告)日: 2024-01-02
- 发明人: Qiyuan Wei , Ying-chi Wang , Cheng-ming Liu , Chien-hung Lin , Li-wei Kung
- 申请人: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- 申请人地址: CN Chongqing
- 专利权人: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- 当前专利权人: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- 当前专利权人地址: CN Chongqing
- 代理机构: Hauptman Ham, LLP
- 优先权: CN 2010317744.1 2020.04.21
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; H01L21/68 ; H01F7/20 ; B25J15/06 ; B25J13/08 ; B25J15/00 ; H01F7/06
摘要:
A device, apparatus, and method for semiconductor transfer are provided. A transfer substrate is controlled to be moved to be above the target substrate. An infrared emitting portion emits infrared signals to position a semiconductor on a target substrate. After a second magnetic portion picks up the semiconductor from the target substrate, a controller outputs a first control current to a first electromagnetic portion to cause the first electromagnetic portion to generate an electromagnetic force, to control the second magnetic portion to adjust a position of the picked-up semiconductor relative to the welding position on the target substrate, where adjusting the position of the picked up semiconductor includes horizontal adjustment.
公开/授权文献
- US20210335648A1 DEVICE, APPARATUS, AND METHOD FOR SEMICONDUCTOR TRANSFER 公开/授权日:2021-10-28
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