- 专利标题: System and method for fabricating polarization holograms
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申请号: US17229844申请日: 2021-04-13
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公开(公告)号: US11860573B1公开(公告)日: 2024-01-02
- 发明人: Mengfei Wang , Junren Wang , Yun-Han Lee , Stephen Choi , Lu Lu , Barry David Silverstein
- 申请人: Meta Platforms Technologies, LLC
- 申请人地址: US CA Menlo Park
- 专利权人: META PLATFORMS TECHNOLOGIES, LLC
- 当前专利权人: META PLATFORMS TECHNOLOGIES, LLC
- 当前专利权人地址: US CA Menlo Park
- 代理机构: MILLBURN IP PLLC
- 主分类号: G03H1/12
- IPC分类号: G03H1/12 ; G03H1/04 ; G02B27/28 ; G03H1/02
摘要:
A system includes a mask configured to forwardly diffract an input beam as a first set of two polarized beams. The system also includes a polarization conversion element configured to convert the first set of two polarized beams into a second set of two polarized beams having opposite handednesses. The two polarized beams having opposite handednesses interfere with one another to generate a polarization interference pattern.
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