- 专利标题: Processing apparatus and processing method
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申请号: US17472920申请日: 2021-09-13
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公开(公告)号: US11859285B2公开(公告)日: 2024-01-02
- 发明人: Hiroki Iriuda , Kuniyasu Sakashita
- 申请人: Tokyo Electron Limited
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Venjuris, P.C.
- 优先权: JP 20156408 2020.09.17
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; H01L21/02 ; C23C16/52
摘要:
A processing apparatus includes: a processing container having a substantially cylindrical shape; a gas nozzle extending in a longitudinal direction of the processing container along an inside of a side wall of the processing container; an exhaust body formed on the side wall on an opposite side of the processing container to face the processing gas nozzle; and an adjustment gas nozzle configured to eject a concentration adjustment gas toward a center of the processing container. The adjustment gas nozzle is provided within an angle range in which the exhaust body is formed at a central angle with reference to the center of the processing container in a plan view from the longitudinal direction.
公开/授权文献
- US20220081773A1 PROCESSING APPARATUS AND PROCESSING METHOD 公开/授权日:2022-03-17
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