- 专利标题： Cleaning method for photo masks and apparatus therefor
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申请号： US17853624申请日： 2022-06-29
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公开(公告)号： US11852969B2公开(公告)日： 2023-12-26
- 发明人: Hsin-Chang Lee , Pei-Cheng Hsu , Hao-Ping Cheng , Ta-Cheng Lien
- 申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址： TW Hsinchu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址： TW Hsinchu
- 代理机构： Studebaker & Brackett PC
- 主分类号： G03F1/82
- IPC分类号： G03F1/82 ; G03F1/64
摘要：
In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.
公开/授权文献
- US20220334468A1 CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR 公开/授权日：2022-10-20
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