Invention Grant
- Patent Title: Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning
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Application No.: US17091105Application Date: 2020-11-06
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Publication No.: US11823916B2Publication Date: 2023-11-21
- Inventor: Wei Lu , Jimin Zhang , Jianshe Tang , Brian J. Brown
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: PATTERSON & SHERIDAN, LLP
- Agent Marcus Hammack
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; H01L21/687
Abstract:
The present disclosure relates to load cups that include an annular substrate station configured to receive a substrate. The annular substrate station surrounds a nebulizer located within the load cup. The nebulizer includes a set of energized fluid nozzles disposed on an upper surface of the nebulizer adjacent to an interface between the annular substrate station and the nebulizer. The set of energized fluid nozzles are configured to release energized fluid at an upward angle relative to the upper surface.
Public/Granted literature
- US20220148892A1 APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRIER HEAD GAP CLEANING Public/Granted day:2022-05-12
Information query
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