- 专利标题： Substrate holder and method of manufacturing a substrate holder
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申请号： US17856520申请日： 2022-07-01
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公开(公告)号： US11754929B2公开(公告)日： 2023-09-12
- 发明人: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/00 ; B23K26/354 ; B23K26/342 ; B22F10/00 ; B22F10/20 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B33Y10/00 ; B33Y80/00 ; B22F7/06 ; B22F10/25 ; B22F10/28 ; B22F10/66
摘要：
A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.
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