- 专利标题: Semiconductor device and massive data storage system including the same
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申请号: US17376240申请日: 2021-07-15
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公开(公告)号: US11715684B2公开(公告)日: 2023-08-01
- 发明人: Sungmin Hwang , Jiwon Kim , Jaeho Ahn , Joonsung Lim , Sukkang Sung
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR 20200142898 2020.10.30
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L23/31 ; H01L23/522 ; H01L23/00 ; H01L25/065 ; H01L25/18 ; H10B43/27
摘要:
A semiconductor device includes lower circuit patterns on a lower substrate; lower bonding patterns on the lower circuit patterns, the lower bonding patterns including a conductive material and being electrically connected to the lower circuit patterns; upper bonding patterns on and contacting the lower bonding patterns, and including a conductive material; a passive device on the upper bonding patterns, and including a conductive material and contacting one of the upper bonding patterns; a gate electrode structure on the passive device, and including gate electrodes spaced apart from each other in a first direction, each of which extends in a second direction, and extension lengths in the second direction of the gate electrodes increasing from a lowermost level toward an uppermost level in a stepwise manner; a channel extending through at least a portion of the gate electrode structure; and an upper substrate on the channel.
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