- 专利标题: Phase-change memory and method of forming same
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申请号: US17666230申请日: 2022-02-07
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公开(公告)号: US11696519B2公开(公告)日: 2023-07-04
- 发明人: Jau-Yi Wu
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Slater Matsil, LLP
- 分案原申请号: US16727363 2019.12.26
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24 ; H10N70/00 ; H10B63/00 ; H10N70/20
摘要:
A device and a method of forming the same are provided. The device includes a substrate, a first dielectric layer over the substrate, a bottom electrode extending through the first dielectric layer, a first buffer layer over the bottom electrode, a phase-change layer over the first buffer layer, a top electrode over the phase-change layer, and a second dielectric layer over the first dielectric layer. The second dielectric layer surrounds the phase-change layer and the top electrode. A width of the top electrode is greater than a width of the bottom electrode.
公开/授权文献
- US20220158089A1 Phase-Change Memory and Method of Forming Same 公开/授权日:2022-05-19
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