Invention Grant
- Patent Title: Method for producing structure, and structure
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Application No.: US16615816Application Date: 2018-05-24
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Publication No.: US11569192B2Publication Date: 2023-01-31
- Inventor: Yuji Eguchi , Kohei Seyama , Tomonori Nakamura , Hiroshi Kikuchi , Takehito Shimatsu , Miyuki Uomoto
- Applicant: SHINKAWA LTD. , TOHOKU UNIVERSITY
- Applicant Address: JP Tokyo; JP Miyagi
- Assignee: SHINKAWA LTD.,TOHOKU UNIVERSITY
- Current Assignee: SHINKAWA LTD.,TOHOKU UNIVERSITY
- Current Assignee Address: JP Tokyo; JP Miyagi
- Agency: JCIPRNET
- Priority: JPJP2017-103175 20170525
- International Application: PCT/JP2018/019972 WO 20180524
- International Announcement: WO2018/216763 WO 20181129
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
This method for producing a structure wherein base materials are bonded by atomic diffusion comprises: a step for applying a liquid resin on the base material; a step for smoothing the surface of the liquid resin by surface tension; a step for forming a resin layer by curing; a step for forming a metal thin film on the resin layer; a step for forming a metal thin film on the base material; and a step for bringing the metal thin film of the base material and the metal thin film of the base material into close contact with each other, thereby bonding the metal thin film of the resin layer and the metal thin film of the base material with each other by atomic diffusion.
Public/Granted literature
- US20200083190A1 METHOD FOR PRODUCING STRUCTURE, AND STRUCTURE Public/Granted day:2020-03-12
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