Invention Grant
- Patent Title: Object in a lithographic apparatus
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Application No.: US17279133Application Date: 2019-09-25
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Publication No.: US11550234B2Publication Date: 2023-01-10
- Inventor: Andrey Nikipelov , Johan Franciscus Maria Beckers
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18197937 20181001
- International Application: PCT/EP2019/075801 WO 20190925
- International Announcement: WO2020/069931 WO 20200409
- Main IPC: G03F7/20
- IPC: G03F7/20 ; C23C16/40 ; C23C14/08
Abstract:
An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.
Public/Granted literature
- US20210397100A1 AN OBJECT IN A LITHOGRAPHIC APPARATUS Public/Granted day:2021-12-23
Information query
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