- 专利标题: Stage device, charged particle beam apparatus, and vacuum apparatus
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申请号: US17043950申请日: 2019-03-01
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公开(公告)号: US11417496B2公开(公告)日: 2022-08-16
- 发明人: Motohiro Takahashi , Takanori Kato , Naruo Watanabe , Hironori Ogawa
- 申请人: Hitachi, Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 优先权: JPJP2018-098995 20180523
- 国际申请: PCT/JP2019/008226 WO 20190301
- 国际公布: WO2019/225110 WO 20191128
- 主分类号: H01J37/20
- IPC分类号: H01J37/20
摘要:
The problem addressed by the present disclosure is to provide a stage device, a charged particle beam device, and a vacuum device, with which it is possible to increase the speed and the acceleration of positioning and to suppress the leakage of a magnetic field. As a means to resolve this problem, a stage device 100 comprises a support stage 10, a floating mechanism 20, and a movement stage 30. The movement stage 30 has a propulsion-applying unit 36, and the support stage 10 has a propulsion-receiving unit 11. The stage device 100 is configured so that when the movement stage 30 moves and the propulsion-applying unit 36 contacts or approaches the propulsion-receiving unit 11, the propulsion-applying unit 36 applies propulsion in the movement direction to the propulsion-receiving unit 11.
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