- 专利标题: Process for handling MEMS wafers
-
申请号: US16889734申请日: 2020-06-01
-
公开(公告)号: US11355383B2公开(公告)日: 2022-06-07
- 发明人: Nicolas Arnal , Troy Pasiola Quimpo , Angus North
- 申请人: MEMJET TECHNOLOGY LIMITED
- 申请人地址: IE Dublin
- 专利权人: MEMJET TECHNOLOGY LIMITED
- 当前专利权人: MEMJET TECHNOLOGY LIMITED
- 当前专利权人地址: IE Dublin
- 代理机构: Cooley LLP
- 主分类号: H01L21/30
- IPC分类号: H01L21/30 ; H01L21/46 ; H01L21/78 ; B32B7/12 ; H01L21/683
摘要:
A process for handling MEMS wafers includes the steps of: (i) attaching a first carrier substrate to a first side of a MEMS wafer, the first carrier substrate being attached via a first wafer bonding tape and a silicone-free peel tape, the peel tape contacting the first side of the MEMS wafer; (ii) performing wafer processing steps on an opposite second side of the MEMS wafer; (iii) releasing the first carrier substrate from the first side of the MEMS wafer via exposure to an energy source, the energy source selectively releasing the wafer bonding tape from the first side of the MEMS wafer; and (iv) peeling the peel tape away from the first side of the MEMS wafer.
公开/授权文献
- US20200381284A1 PROCESS FOR HANDLING MEMS WAFERS 公开/授权日:2020-12-03
信息查询
IPC分类: