- 专利标题： Photo-curable composition and patterning method using the same
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申请号： US16719647申请日： 2019-12-18
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公开(公告)号： US11332597B2公开(公告)日： 2022-05-17
- 发明人: Toshiki Ito , Chieko Mihara , Kanae Kawahata , Motoki Okinaka , Youji Kawasaki
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 代理机构： Canon U.S.A., Inc. IP Division
- 优先权： JP2011-246714 20111110
- 主分类号： C08K5/06
- IPC分类号： C08K5/06 ; H05K3/00 ; B05D3/12 ; B05D3/06 ; G03F7/031 ; G03F7/038 ; B82Y10/00 ; B82Y40/00 ; G03F7/004 ; G03F7/00 ; G03F7/027 ; C08F2/24 ; C08F2/48
摘要：
The present invention provides a photo-curable composition, and UV imprint method, that requires a small demolding force, wherein the photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C), and the photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
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