- 专利标题: Composite substrate and method of manufacturing composite substrate
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申请号: US16073063申请日: 2017-01-06
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公开(公告)号: US11245377B2公开(公告)日: 2022-02-08
- 发明人: Shoji Akiyama , Masayuki Tanno
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Hauptman Ham, LLP
- 优先权: JPJP2016-017916 20160202,JPJP2016-043992 20160308
- 国际申请: PCT/JP2017/000272 WO 20170106
- 国际公布: WO2017/134980 WO 20170810
- 主分类号: H03H3/08
- IPC分类号: H03H3/08 ; H03H9/02 ; H01L41/187 ; H01L41/312 ; H03H3/02 ; H03H9/25 ; H01L21/86 ; H01L41/337
摘要:
A composite substrate includes a single crystal support substrate containing first element as a main component; an oxide single crystal layer provided on the single crystal support substrate and containing a second element (excluding oxygen) as a main component; and an amorphous layer provided in between the single crystal support substrate and the oxide single crystal layer and containing a first element, a second element, and Ar, the amorphous layer having a first amorphous region in which proportion of the first element is higher than proportion of the second element, and a second amorphous region in which the proportion of the second element is higher than the proportion of the first element, concentration of Ar contained in the first amorphous region being higher than concentration of Ar contained in the second amorphous region and being 3 atom % or more.
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