Electro-optic silicon nitride via electric poling
摘要:
A deposition method for manufacturing an active electro-optic layer includes providing a substrate or a base layer; and applying an electric field across a silicon nitride layer as it is being deposited on the substrate or the base layer to cause a poling of a deposited layer. Alternative methods for poling an active electro-optic layer and an electro-optical device are also described.
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