Invention Grant
- Patent Title: Ellipsometer and inspection device for semiconductor device
-
Application No.: US17036185Application Date: 2020-09-29
-
Publication No.: US11193882B2Publication Date: 2021-12-07
- Inventor: Yasuhiro Hidaka
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2019-212990 20191126,KR10-2020-0018249 20200214
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01B9/02 ; G02B27/28 ; G01B11/00

Abstract:
Provided is an ellipsometer including a polarizing optical device configured to separate light, reflected from a sample that is irradiated with illumination light comprising a linearly polarized light, into a first linearly polarized light in a first polarization direction and a second linearly polarized light in a second polarization direction that is orthogonal to the first polarization direction, and a light-receiving optical system configured to calculate an Ψ and Δ, an amplitude ratio and a phase difference of the two polarized light respectively, from an interference fringe formed by interference between the first linearly polarized light and the second linearly polarized light after passing through an analyzing device with transmission axis different from the first polarization direction and the second polarization direction.
Public/Granted literature
- US20210156790A1 ELLIPSOMETER AND INSPECTION DEVICE FOR SEMICONDUCTOR DEVICE Public/Granted day:2021-05-27
Information query