A method for manufacturing a color resist is disclosed. According to the method, a mask is moved so that an alignment mark is aligned with marks of a black matrix layer respectively. Each color resist and a corresponding color block are formed on the black matrix layer by the mask, and a position of each color resist is checked according to a positional relationship between a corresponding color block and hollowed-out region. A distance between a first mark and a second mark and a distance between a first mark and a third mark are configured in such manner that the color blocks do not overlap with one another. Therefore, the color blocks do not overlap with one another while a size thereof does not change.