发明授权
- 专利标题: Redistribution structures for semiconductor packages and methods of forming the same
-
申请号: US16058692申请日: 2018-08-08
-
公开(公告)号: US11062915B2公开(公告)日: 2021-07-13
- 发明人: Yu-Hsiang Hu , Hung-Jui Kuo , Chen-Hua Yu
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L21/48
- IPC分类号: H01L21/48 ; H01L23/00 ; H01L21/56 ; H01L23/498 ; H01L21/683
摘要:
A method for forming a redistribution structure in a semiconductor package and a semiconductor package including the redistribution structure are disclosed. In an embodiment, the method may include encapsulating an integrated circuit die and a through via in a molding compound, the integrated circuit die having a die connector; depositing a first dielectric layer over the molding compound; patterning a first opening through the first dielectric layer exposing the die connector of the integrated circuit die; planarizing the first dielectric layer; depositing a first seed layer over the first dielectric layer and in the first opening; and plating a first conductive via extending through the first dielectric layer on the first seed layer.
公开/授权文献
信息查询
IPC分类: