- 专利标题: Heat-curable resin composition and semiconductor device
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申请号: US16523040申请日: 2019-07-26
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公开(公告)号: US11059973B2公开(公告)日: 2021-07-13
- 发明人: Yoshihiro Tsutsumi , Naoyuki Kushihara , Norifumi Kawamura , Yoshihira Hamamoto , Yuki Kudo
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JPJP2018-151007 20180810
- 主分类号: C08L83/08
- IPC分类号: C08L83/08 ; C08K3/013 ; C08G77/26 ; H01L23/29
摘要:
Provided are a resin composition capable of yielding a cured product exhibiting a superior heat resistance over a long period of time, and a superior reflow resistance due to a low water absorption rate even at a high temperature; and a semiconductor device encapsulated by such cured product. The resin composition is a heat-curable resin composition containing: (A) an organopolysiloxane having, in one molecule, at least one cyclic imide group and at least one siloxane bond; (B) an inorganic filler; and (C) a radical polymerization initiator. The semiconductor device is encapsulated by the cured product of such heat-curable resin composition.
公开/授权文献
- US20200048464A1 HEAT-CURABLE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE 公开/授权日:2020-02-13
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