- 专利标题: Method and system for water soluble weak acidic resins as carbon precursors for silicon-dominant anodes
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申请号: US16896872申请日: 2020-06-09
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公开(公告)号: US11056686B1公开(公告)日: 2021-07-06
- 发明人: Younes Ansari , Liwen Ji , Benjamin Park
- 申请人: Enevate Corporation
- 申请人地址: US CA Irvine
- 专利权人: Enevate Corporation
- 当前专利权人: Enevate Corporation
- 当前专利权人地址: US CA Irvine
- 代理机构: McAndrews, Held & Malloy, Ltd.
- 主分类号: H01M4/38
- IPC分类号: H01M4/38 ; H01M4/04 ; H01M10/0525 ; H01M4/66 ; H01M10/0566 ; H01M10/0565 ; H01M4/583 ; H01M10/0562
摘要:
Systems and methods for water soluble weak acidic resins as carbon precursors for silicon-dominant anodes may include an electrode coating layer on a current collector, where the electrode coating layer is formed from silicon and pyrolyzed water-soluble acidic polyamide imide as a primary resin carbon precursor. The electrode coating layer may include a pyrolyzed water-based acidic polymer solution additive. The polymer solution additive may include one or more of: polyacrylic acid (PAA) solution, poly (maleic acid, methyl methacrylate/methacrylic acid, butadiene/maleic acid) solutions, and water soluble polyacrylic acid. The electrode coating layer may include conductive additives. The current collector may include a metal foil, where the metal current collector includes one or more of a copper, tungsten, stainless steel, and nickel foil in electrical contact with the electrode coating layer. The electrode coating layer may be more than 70% silicon.
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