- 专利标题: Resist composition, method of forming resist pattern, and compound
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申请号: US16225290申请日: 2018-12-19
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公开(公告)号: US11036131B2公开(公告)日: 2021-06-15
- 发明人: Takashi Nagamine , Tsuyoshi Nakamura , Kazuishi Tanno
- 申请人: TOKYO OHKA KOGYO CO., LTD.
- 申请人地址: JP Kawasaki
- 专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址: JP Kawasaki
- 代理机构: Knobbe Martens Olson & Bear LLP
- 优先权: JPJP2017-253724 20171228
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/039 ; C07C309/06 ; C07C309/12 ; C07C309/19 ; C07J9/00 ; G03F7/20 ; C07J31/00 ; C07J19/00 ; C07J43/00 ; G03F7/038 ; C08L33/14 ; C07C309/04 ; C07C303/32 ; G03F7/30 ; C08G61/04 ; G03F7/38
摘要:
A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalent linking group having a hetero atom, Vb1 represents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vb2 represents an alkylene group, a fluorinated alkylene group, or a single bond, Rf1 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation
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