- 专利标题: Array substrate and method of manufacturing the same, display panel and display apparatus
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申请号: US16832155申请日: 2020-03-27
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公开(公告)号: US11036108B2公开(公告)日: 2021-06-15
- 发明人: Yuntian Zhang , Peng Jiang , Ke Dai , Jingang Liu , Lihui Han , Zhonghou Wu , Chunxu Zhang , Mengmeng Li
- 申请人: HEFEI BOE DISPLAY TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Anhui; CN Beijing
- 专利权人: HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: HEFEI BOE DISPLAY TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Anhui; CN Beijing
- 代理机构: McDermott Will and Emery LLP
- 优先权: CN201910798360.3 20190827
- 主分类号: G02F1/1362
- IPC分类号: G02F1/1362 ; G09G3/34 ; G02F1/1333 ; G02F1/13357 ; G02F1/1368 ; G02F1/1335
摘要:
An array substrate includes a substrate, at least one first light-shielding layer disposed above the substrate, semiconductor retention layers disposed on a side of the at least one first light-shielding layer facing away from the substrate, and data lines disposed on a side of the plurality of semiconductor retention layers facing away from the at least one first light-shielding layer. One first light-shielding layer of the at least one first light-shielding layer is disposed between one semiconductor retention layer of the semiconductor retention layers and the substrate, and an orthographic projection of the first light-shielding layer on the substrate covers an orthographic projection of the semiconductor retention layer on the substrate. The data lines are in one-to-one correspondence with the semiconductor retention layers, and an orthographic projection of each data line on the substrate overlaps with an orthographic projection of a corresponding semiconductor retention layer on the substrate.
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