Invention Grant
- Patent Title: Method for generating layout diagram including cell having pin patterns and semiconductor device based on same
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Application No.: US16659351Application Date: 2019-10-21
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Publication No.: US11030372B2Publication Date: 2021-06-08
- Inventor: Pin-Dai Sue , Chin-Chou Liu , Sheng-Hsiung Chen , Fong-Yuan Chang , Lee-Chung Lu , Yen-Hung Lin , Li-Chun Tien , Po-Hsiang Huang , Yi-Kan Cheng , Chi-Yu Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F30/00
- IPC: G06F30/00 ; G06F30/392 ; G06F30/394 ; G06F111/20

Abstract:
A method (of generating a layout diagram) includes generating a cell, representing at least part of a circuit in a semiconductor device, which is arranged at least in part according to second tracks of the M_2nd level (M_2nd tracks), and first tracks of the M_1st level (M_1st tracks). The generating the cell includes: selecting, based on a chosen site for the cell in the layout diagram, one of the M_2nd tracks; generating a first M_2nd pin pattern representing an output pin of the circuit; arranging a long axis of the first pin pattern substantially along the selected M_2nd track; generating second, third, fourth and fifth M_1st pin patterns representing corresponding input pins of the circuit; and arranging long axes of the second to fifth pin patterns substantially along corresponding ones of the M_1st tracks.
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