发明授权
- 专利标题: Automated application of drift correction to sample studied under electron microscope
-
申请号: US16951297申请日: 2020-11-18
-
公开(公告)号: US10986279B1公开(公告)日: 2021-04-20
- 发明人: Franklin Stampley Walden, II , John Damiano, Jr. , David P. Nackashi , Daniel Stephen Gardiner , Mark Uebel , Alan Philip Franks , Benjamin Jacobs
- 申请人: Protochips, Inc.
- 申请人地址: US NC Morrisville
- 专利权人: Protochips, Inc.
- 当前专利权人: Protochips, Inc.
- 当前专利权人地址: US NC Morrisville
- 代理机构: NK Patent Law
- 主分类号: G01B11/16
- IPC分类号: G01B11/16 ; H04N5/232 ; G06T7/33 ; G06T7/215
摘要:
Control system configured for sample tracking in an electron microscope environment registers a movement associated with a region of interest located within an active area of a sample under observation with an electron microscope. The registered movement includes at least one directional constituent. The region of interest is positioned within a field of view of the electron microscope. The control system directs an adjustment of the electron microscope control component to one or more of dynamically center and dynamically focus the view through the electron microscope of the region of interest. The adjustment comprises one or more of a magnitude element and a direction element.
公开/授权文献
信息查询