- 专利标题: Method of aligning wafers, method of bonding wafers using the same, and apparatus for performing the same
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申请号: US16402747申请日: 2019-05-03
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公开(公告)号: US10937756B2公开(公告)日: 2021-03-02
- 发明人: Hyun-Mog Park
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Lee IP Law, P.C.
- 优先权: KR10-2018-0121028 20181011
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L23/00 ; H01L23/544 ; H01L21/67 ; H01L21/68 ; H01L21/306 ; H01L21/268
摘要:
In a method of aligning wafers, a second wafer having at least one second alignment key may be arranged over a first wafer having at least one first alignment key. At least one alignment hole may be formed by passing through the second wafer to expose the second alignment key and the first alignment key. The first wafer and the second wafer may be aligned with each other using the first alignment key and the second alignment key exposed through the alignment hole. Thus, the first alignment key and the second alignment key exposed through the alignment hole may be positioned at a same vertical line to accurately align the first wafer with the second wafer.
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