- 专利标题: Nanoimprint template with light blocking material and method of fabrication
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申请号: US15720308申请日: 2017-09-29
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公开(公告)号: US10935883B2公开(公告)日: 2021-03-02
- 发明人: Amir Tavakkoli Kermani Ghariehali , Edward Brian Fletcher
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 代理商 Cameron A. King
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; B29C39/04 ; B29C39/26 ; B29C33/38 ; H01L21/027 ; B29L31/34
摘要:
A nanoimprint lithography template, method of fabrication, and method of manufacturing an article using the same. The template includes a body having first and second opposed sides, the second side having a mesa extending therefrom, with the mesa having sidewalls and a surface. A recessed shelf extends around a perimeter of the mesa surface, with a light-blocking material positioned on at least the recessed shelf and at a thickness such that the light-blocking material does not extend beyond a plane defined by the mesa surface.
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