- 专利标题： Attachment feature removal from photomask in extreme ultraviolet lithography application
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申请号： US16661541申请日： 2019-10-23
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公开(公告)号： US10928724B2公开(公告)日： 2021-02-23
- 发明人: Banqiu Wu , Eli Dagan , Khalid Makhamreh , Bruce J. Fender
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson + Sheridan, LLP
- 主分类号： G03F1/82
- IPC分类号： G03F1/82 ; G03F7/20 ; G03F1/62 ; G03F1/64
摘要：
Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a photomask includes an attachment feature puller comprising an actuator, a clamp coupled to the actuator, the clamp adapted to grip an attachment feature, and a coil assembly disposed adjacent to the attachment feature.
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