Invention Grant
- Patent Title: Nanotube structure based metal damascene process
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Application No.: US15693511Application Date: 2017-09-01
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Publication No.: US10910309B2Publication Date: 2021-02-02
- Inventor: Ravi Joshi , Juergen Steinbrenner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner MBB
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L23/532 ; H01L21/768 ; H01L21/02 ; H01L21/285 ; H01L21/311

Abstract:
In various embodiments a method for manufacturing a metallization layer on a substrate is provided, wherein the method may include providing a structured layer of a catalyst material on the substrate, the catalyst material may include a first layer of material arranged over the substrate and a second layer of material arranged over the first layer of material, wherein the structured layer of catalyst material having a first set of regions including the catalyst material over the substrate and a second set of regions free of the catalyst material over the substrate, and forming a plurality of groups of nanotubes over the substrate, each group of the plurality of groups of nanotubes includes a plurality of nanotubes formed over a respective region in the first set of regions.
Public/Granted literature
- US20180012836A1 NANOTUBE STRUCTURE BASED METAL DAMASCENE PROCESS Public/Granted day:2018-01-11
Information query
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